Author's Latest Posts


EDA In The Cloud


Interest in the use of third-party public clouds in conjunction with electronic design automation (EDA) applications has never been higher. Back in February, Ed Sperling and I did a video interview (embedded below) to discuss EDA and cloud computing. This article follows up on that interview, providing some additional insight into why and how the integrated circuit (IC) industry reached this po... » read more

Pattern Matching in Design and Verification


Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography. These rule checks proved far more complex to write, hard to code for fast runtimes, and difficult to debug. Incorporating an automated visual capture and compare process enabled designers to define t... » read more