Author's Latest Posts

Vapor-Deposited Octadecanethiol Masking Layer on Copper for Selective Hf3N4 ALD

By Veeco - 14 Jan, 2019 - Comments: 0

Full title: Vapor-deposited octadecanethiol masking layer on copper to enable area selective Hf3N4 atomic layer deposition on dielectrics studied by in situ spectroscopic ellipsometry Journal of Vacuum Science & Technology A 36, 031605 (2018); Authors: Laurent Lecordiera, Veeco Instruments Sebastiaan Herregods and Silvia Armini, IMEC Area-selective atomic layer deposition (AS-ALD) h... » read more

Cost Analysis of a Wet Etch TSV Reveal Process

By Veeco - 10 Dec, 2018 - Comments: 0

Through silicon via (TSV) technology is a key design element being incorporated into more and more advanced packaging designs today. TSVs offer distinct benefits in form factor and improved performance and can enable new, innovative designs not previously possible. To scale this valuable technology and spark industry adoption, there is a need to refine and optimize the TSV reveal process to red... » read more

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