Author's Latest Posts


Packaging Wars Begin


The advanced IC-packaging market is turning into a high-stakes competitive battleground, as vendors ramp up the next wave of [getkc id="82" kc_name="2.5D"]/[getkc id="42" kc_name="3D"] technologies, high-density fan-out packages and others. At one time, the outsourced semiconductor assembly and test ([getkc id="83" comment="OSAT"]) vendors dominated and handled the chip-packaging requirement... » read more

The Week In Review: Manufacturing


Fab tools and T&M Applied Materials and the Institute of Microelectronics (IME), a research institute under the Agency for Science, Technology and Research (A*STAR), have announced a five-year extension of their R&D collaboration at the Centre of Excellence in Advanced Packaging in Singapore. The organizations will expand the scope of their R&D collaboration to focus on advancing fan-out wafer... » read more

5 Takeaways From BACUS


As usual, the recent SPIE Photomask Technology Conference, sometimes called BACUS, was a busy event. The event, which took place in San Jose, Calif., featured presentations on the usual subjects in the photomask sector. There were presentations on mask writers, inspection, metrology, repair and cleaning. And, of course, the papers included masks based on extreme ultraviolet (EUV) lithography... » read more

Mask Maker Worries Grow


Photomasks are becoming more complex and expensive at each node, thereby creating a number of challenges on several fronts. For one thing, the features on the [getkc id="265" kc_name="photomask"] are becoming smaller and more complex at each node. Second, the number of masks per mask-set are increasing as a result of multiple patterning. Third, it costs more to build and equip a new mask fab... » read more

Sorting Out Next-Gen Memory


In the data center and related environments, high-end systems are struggling to keep pace with the growing demands in data processing. There are several bottlenecks in these systems, but one segment that continues to receive an inordinate amount of attention, if not part of the blame, is the memory and storage hierarchy. [getkc id="92" kc_name="SRAM"], the first tier of this hierarchy, is... » read more

Deploying Multi-Beam Mask Writers


Elmar Platzgummer, chief executive of IMS Nanofabrication, sat down with Semiconductor Engineering to discuss the company’s deal with Intel, photomasks, multi-beam mask writer technology and other topics. What follows are excerpts of that conversation. SE: This has been a significant year for IMS for two reasons. First, Intel recently announced plans to acquire IMS. Second, at the recent ... » read more

Manufacturing Bits: Sept. 20


Crystal database The University of California at San Diego and Lawrence Berkeley National Laboratory have created an open-source database of elemental crystal surfaces and shapes. The database, called Crystalium, is a new and expanding set of information about various crystals. The database can help researchers design new materials for various applications, such as batteries, catalytic conv... » read more

The Week In Review: Manufacturing


Chipmakers The finFET market is heating up. GlobalFoundries, Intel, Samsung and TSMC are ramping 16nm/14nm finFETs. And 10nm and 7nm finFETs are in the works. The market will shortly have a new competitor—Taiwan’s United Microelectronics Corp. (UMC). Some years ago, UMC licensed finFET technology from IBM. UMC has been a bit quiet about the 14nm finFET technology, but it has made si... » read more

7nm Market Heats Up


The 7nm finFET market is heating up in the foundry business amid the ongoing push to develop chips at advanced nodes. Not long ago, TSMC announced plans to enter the 7nm finFET market. In addition, Intel and Samsung are also separately planning to enter the 7nm finFET race. Now, GlobalFoundries is formally announcing its 7nm finFET technology. Slated for 2018, GlobalFoundries’ 7nm fin... » read more

Manufacturing Bits: Sept. 13


Direct-write liquid litho The Department of Energy’s Oak Ridge National Laboratory has developed what could be called direct-write liquid lithography. In the lab, researchers have modified a scanning transmission electron microscope (STEM). Then, using the STEM as an e-beam tool, researchers have devised a technology that enables the direct write of tiny features in “microfabricated liq... » read more

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