Author's Latest Posts


Design Compliant Source Mask Optimization (SMO)


Source Mask Optimization (SMO) is required to extend the use of 193 water immersion lithography to the 22nm technology node. Although SMO is being aggressively pushed in volume production the layout design implications of this technology have not been openly discussed. In this paper, the impact of layout design style on simultaneous SMO of Logic and SRAM is studied. In particular the improvemen... » read more

Estimating MOSFET Leakage From Low-Cost, Low-Resolution Fast Parametric Test


A method of estimating the subthershold component of MOSFET off-state current (Ioffs) using low-cost, low-resolution fast parallel parametric test is introduced. This method measures the subthreshold slope and uses it to estimate Ioffs. Measurements of individual transistors show a very good agreement between measured Ioffs and Ioffs estimated using our approach. For a simple pad-efficient tran... » read more