EUV Lithography light source maker, Gigaphoton has developed a laser-produced plasma (LPP) light source prototype model that can produce a maximum of 92 watts. This is more than double the 43 watts produced using a traditional LPP light source.
Figure 1 conceptual diagram of EUV exposure. Source: Gigaphoton/EUVA
The biggest issue with EUV lithography has been the output power of the lig...
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