Author's Latest Posts

A Guide To FT‑NIR Spectroscopy In The Chemical Lab

By Bruker - 10 Feb, 2022 - Comments: 0

Quality control in the chemical and petrochemical industry is a complex task. Often the many different parameters need to be analyzed using a wide variety of instruments and complex workflows. Timing is also very important — the production team needs results within minutes, not hours. FT-NIR can help you simplify analysis routines in the lab. Often, many different parameters can be analyzed w... » read more

Residual Stress With EIGER2 R 500K

By Bruker - 10 Aug, 2021 - Comments: 0

Many manufacturing processes leave residual stresses which can affect the performance of manufactured components. Compressive stress can be engineered into a metal coating to resist crack propagation, while tensile stress can be exploited to enhance conductivity in semiconductors. Strained materials exhibit changes in atomic spacing which can be detected by X-ray diffraction (XRD) and related t... » read more

Characterization Of CMP Processes With White Light Interferometry

By Bruker - 08 Jun, 2021 - Comments: 0

Faster computer and electronic processors require smaller features for integrated circuits (IC), which in turn require smaller and smoother substrate surfaces. Chemical mechanical polishing (CMP) has become one of the most critical semiconductor fabrication technologies because it offers a superior means of removing unwanted topography in interlevel dielectric layers and achieving sufficient pl... » read more

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