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Survey: 2019 eBeam Initiative Perceptions Survey Results
By eBeam Initiative - 16 Sep, 2020 - Comments: 0

Results of the 2020 eBeam Initiative Perceptions survey, now called the Luminaries survey, will be made available starting on September 22 here: Meanwhile, here is the 8th Annual Perceptions Survey – 2019 (July). 68 luminaries across 42 different companies participated. Some highlights: Deep learning impact predicted by 2020: 76% of the respondents say it’s somewhat to very lik... » read more

Enabling Curvilinear Masks
By eBeam Initiative - 18 Jun, 2020 - Comments: 0

This talk by Leo Pang, Chief Product Officer of D2S, takes a look at a unique GPU-accelerated approach to curvilinear inverse lithography technology (ILT) and introduces mask-wafer co-optimization (MWCO) that enables writing curvilinear ILT for 193i on VSB or multi-beam machines in 12 hours. » read more

Survey: 2019 eBeam Initiative Mask Makers’ Survey Results
By eBeam Initiative - 22 Jan, 2020 - Comments: 0

In 2019, eBeam Initiative's Multi-beam Masks survey reported for the first time • 599,536 masks reported by 11 companies • 2789 were EUV masks • Average mask turnaround time (TAT) for =7nm was 11 days. Click here to see the survey results. » read more

EUV Annual Perceptions Survey – 2019
By eBeam Initiative - 18 Sep, 2019 - Comments: 0

8th Annual Perceptions Survey – 2019 (July) of 68 luminaries across 42 different companies about use of EUV. Confidence in EUV remains high • 73% predict HVM by end of 2020 • Outlook is positive for actinic inspection and pellicle Click here to see survey slides. » read more

2018 eBeam Initiative Perceptions Survey Results
By eBeam Initiative - 14 Dec, 2018 - Comments: 0

EUV confidence and multi-beam remains high in the 7th Annual Perceptions Survey – 2018 (July). EUV perceptions remain positive. 82% of respondents predict EUV in HVM by end of 2021. Only 1% predict EUV will never happen. Confidence is high again for EUV lithography in high-volume manufacturing and expectations continue to grow around actinic mask inspection for EUV. Perceptions on the nee... » read more

Complementary E Beam Lithography
By eBeam Initiative - 19 Aug, 2015 - Comments: 0

Multibeam Chairman David Lam looks at complementary E-Beam lithography (CEBL) and the impact of 1D design and pitch division. [youtube vid=nyvplBl4HA4] » read more

Conquering Heat Issues In e-beam Lithography
By eBeam Initiative - 18 Jun, 2015 - Comments: 0

By Noriaki Nakayamada What's the best way to deal with the menacing heating effects in VSB mask writing? The answer lies in part on leveraging GPU acceleration. Check out this video on what's ahead for multi-beam mask writing. [youtube vid=Ij2l3hk6aFg] —Noriaki Nakayamada is group manager at NuFlare Technology. » read more

Custom Print For Multi-Column Inspection
By eBeam Initiative - 16 Oct, 2014 - Comments: 0

By Tony Luo What are the challenges in optical inspection? Let's take a closer look. Click on the video below to find out. [youtube vid=vzFSyHwD_AU] —Tony Luo is the founder of Singapore-based Maglen. » read more

2014 eBeam Survey Results
By eBeam Initiative - 18 Sep, 2014 - Comments: 0

An industry-wide poll highlights what the industry is thinking about EUV and mask writing at advanced nodes. To view the poll, click here. » read more

From The Whiteboard: David Lam
By eBeam Initiative - 19 Jun, 2014 - Comments: 1

Multibeam's David Lam looks at changes in semiconductor lithography, how CVD and etch improve pitch resolution that is not attainable using optical lithography, and how e-beam direct-write can finish the job. [youtube vid=2ZCF-o7DXlU] » read more

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