The Week In Review: Manufacturing


Market research The IC market remains hot, as several market researchers are raising their forecasts--again. Gartner recently raised its overall IC forecast. Now, IC Insights has raised its IC market growth rate forecast for 2017 to 22%, up six percentage points from the 16% increase shown in its mid-year update. In March, IC Insights raised its worldwide IC market growth forecast for 201... » read more

The Week In Review: Design


M&A Synopsys acquired Sidense, a provider of antifuse one-time programmable (OTP) non-volatile memory (NVM) for standard-logic CMOS processes. Sidense was founded in 2004 in Canada. Terms of the deal were not disclosed. ArterisIP acquired the software and intellectual property rights of iNoCs, a provider of network-on-chip IP and design tools. Founded in 2007, the Swiss company was spun... » read more

The Week in Review: IoT


Acquisitions ASSA ABLOY has agreed to acquire August Home, a startup providing home security products; the purchase price wasn’t revealed. August Home, which raised $75 million in private funding, should fit well with the Scandinavian conglomerate’s Yale lock business. The transaction is subject to regulatory approval and customary closing conditions; it is expected to close by the end of ... » read more

The Great Skills Race


The next phase of the technology race will be fought with qualified people—but not necessarily the same people in the same markets or with the same skill sets. For the past half century, technology wars have been won and lost with inexpensive labor and increasing amounts of automation. This can be traced from the United States in the 1960s to Japan in the 1970s, Korea starting in the mid-... » read more

Exploring New Scaling Approaches


At the recent SPIE Photomask Technology + Extreme Ultraviolet Lithography 2017 conference, Semiconductor Engineering sat down to discuss semiconductor technology with Tsu-Jae King Liu, the TSMC Distinguished Professor in Microelectronics in the Department of Electrical Engineering and Computer Sciences at the University of California at Berkeley. More specifically, Liu discussed some of the new... » read more

Searching For EUV Mask Defects


Chipmakers hope to insert extreme ultraviolet (EUV) lithography at 7nm and/or 5nm, but several challenges need to be solved before this technology can be used in production. One lingering issue that is becoming more worrisome is how to find [gettech id="31045" comment="EUV"] mask defects. That isn't the only issue, of course. The industry continues to work on the power source and resists. Bu... » read more

Improving Optical Overlay And Measurement


By Adam Ge and Shimon Levi Patterning challenges for the semiconductor industry are growing as the number of multi-patterned layers being used in the 10nm and beyond nodes increase. Patterning requires highly accurate overlay which has always been an issue, but with the added complexities of multi-patterning, smaller dimensions and subsequent tightening overlay error budget, it is now a majo... » read more

What’s Up With MEMS?


New sensor technologies, and smarter ways of integrating more intelligence, continue to generate unexpected opportunities in the changing MEMS business. Changes needed for sensors for context awareness If digital assistants are ever going to be really useful, they’ll need some particular sensor capabilities to understand emotion, suggests Lama Nachman, head of Intel’s Anticipatory Compu... » read more

MEMS Market Shifting


The MEMS sector is beginning to look more promising, bolstered by new end-market demand and different packaging options that require more advanced engineering, processes and new materials. All of this points to higher selling prices, which are long overdue in this space. For years, the market for microelectromechanical systems was populated by too many companies vying for too few opportunit... » read more

Controlling Uniformity At The Edge


Chipmakers want every part of the wafer to produce, or yield, good die. Advances in process technologies over the years have just about made this a reality, even as feature dimensions continue to shrink and devices grow ever more complex. Now, the last frontier is improving yields at the edge of the wafer – the outer 10 mm or so – where chemical, physical, and even thermal discontinuitie... » read more

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