Week In Review: Manufacturing, Test

By Mark LaPedus - 21 Sep, 2018 - Comments: 0

Tariffs The Office of the U.S. Trade Representative (USTR) has released a list of $200 billion worth of Chinese imports that will be subject to tariffs. These actions are on top of another set of tariffs, which were put in place. The additional tariffs will be effective starting Sept. 24, and initially will be in the amount of 10%. Starting Jan. 1, 2019, the level of the additional tariffs wi... » read more

Week In Review: Design, Low Power

By Jesse Allen - 21 Sep, 2018 - Comments: 0

Tools & IP Cadence unveiled deep neural-network accelerator (DNA) AI processor IP, Tensilica DNA 100, targeted at on-device neural network inference applications. The processor is scalable from 0.5 TMAC (Tera multiply-accumulate) to 12 TMACs, or 100s of TMACs with multiple processors stacked, and the company claims it delivers up to 4.7X better performance and up to 2.3X more performance p... » read more

Week in Review: IoT, Security, Auto

By Jeff Dorsch - 21 Sep, 2018 - Comments: 0

Internet of Things Release 3 is published by oneM2M, the worldwide Internet of Things interoperability standards initiative. The third set of specifications deals with 3GPP interworking, especially as it relates to cellular IoT connectivity, among other features. The release is said to enable seamless interworking with narrowband IoT and LTE-M connectivity through the 3GPP Service Capability E... » read more

The Big Blur

By Ed Sperling - 20 Sep, 2018 - Comments: 0

Chip companies, research houses, foundries—and more recently large systems companies—have been developing alternative technologies to continue scaling power and performance. It's still not obvious which of those will win, let alone survive, or what they will do to the economics of developing chips. For more than five decades, the biggest concern was scaling devices in order to save money... » read more

The Value of Runtime Knowledge Management

By Applied Materials - 20 Sep, 2018 - Comments: 0

In clinical and commercial manufacturing when measures are taken to prevent deviations, the findings aren’t often shared across the enterprise and when corrective actions are taken to resolve an issue, they often don’t address the actual root cause(s). The Applied SmartFactory® Rx™ Knowledge Management solution allows knowledge captured in the R&D and design phases to be used th... » read more

Atomic Layer Etching: Rethinking the Art of Etch

By Lam Research - 20 Sep, 2018 - Comments: 0

Atomic layer etching (ALE) is the most advanced etching technique in production today. In this Perspective, we describe ALE in comparison to long-standing conventional etching techniques, relating it to the underlying principles behind the ancient art of etching. Once considered too slow, we show how leveraging plasma has made ALE a thousand times faster than earlier approaches. While Si is the... » read more

Advanced Defect Inspection Techniques For nFET And pFET Defectivity At 7nm Gate Poly Removal Process

By KLA-Tencor - 20 Sep, 2018 - Comments: 0

By Ian Tolle, GlobalFoundries, and Michael Daino, KLA-Tencor During 7nm gate poly removal process, polysilicon is removed exposing both NFET and PFET fins in preparation for high-k gate oxide. If the polysilicon etch is too aggressive or the source and drain are not sufficiently protected, the etch can damage the active region and render the FET inoperative. Different materials are used in t... » read more

China’s Electric Car Ambitions

By Mark LaPedus - 20 Sep, 2018 - Comments: 1

China, the world’s largest car market, is also leading the charge in the electric vehicle business. But with little or no fanfare, China also wants to dominate the critical ecosystem for battery-electric vehicles and hybrids. In fact, the nation is already the world’s largest producer of batteries for electric vehicles. And it also controls a sizable part of the supply chain, such as the... » read more

A New Type Of Switch

By David Thompson - 20 Sep, 2018 - Comments: 0

Back in July, Applied Materials announced that we’d been selected by the Defense Advanced Research Projects Agency (DARPA) to develop technology for AI. While Applied is engaged on the development of many disruptive technologies, it’s not often that we’re in a position to discuss them in early development. Thanks to the vision of DARPA’s Electronics Resurgence Initiative and their ... » read more

Cryogenic Etch Re-Emerges

By Mark LaPedus - 20 Sep, 2018 - Comments: 0

After years in R&D, a technology called cryogenic etch is re-emerging as a possible option for production as the industry faces new challenges in memory and logic. Cryogenic etch removes materials in devices with high aspect ratios at cold temperatures, although it has always been a challenging process. Cryogenic etch is difficult to control and it requires specialized cryogenic gases in... » read more

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