category: Blogs – MD

category: IoT, Security & Automotive

Using Process Modeling To Enhance Device Uniformity During Self-Aligned Quadruple Patterning
By Timothy Yang - 18 Nov, 2021 - Comments: 0

Despite the growing interest in EUV lithography, self-aligned quadruple patterning (SAQP) still holds many technical advantages in pattern consistency, simplicity, and cost. This is particularly true for very simple and periodic patterns, such as line & space patterns or hole arrays. The biggest challenge of SAQP is the inherently asymmetric mask shape. This asymmetry can create structural ... » read more

Failure Prediction Is Vital for Packaging Technology
By Sam Sadri - 18 Nov, 2021 - Comments: 0

A while back, I wrote a post on what I call the “10 Commandments of Packaging” – my list of the key things to bear in mind with respect to developing new packaging solutions. Today, packaging engineers must contend with more variables than ever, from new substrate materials to more types of packages with a greater range of complexity. With that complexity comes new challenges, and I felt ... » read more

Semiconductor Photomask Revenues Predicted To Increase In 2021
By Jan Willis - 18 Nov, 2021 - Comments: 0

A majority (72%) of industry luminaries surveyed in July predict an increase in photomask revenues for 2021, as shown in figure 1. SEMI also predicts revenues to increase around 9% from $4.4B in 2020 to $4.8B in 2021. In a 12-minute video, a panel of experts share their perspectives on what’s behind the growth trend, how the pandemic has impacted the photomask industry, and how it compares to... » read more

Workplace Safety Lessons From The Deepwater Horizon Oil Spill
By McKenzie Turner - 18 Nov, 2021 - Comments: 0

The Deepwater Horizon oil spill on April 20th, 2010, was the largest marine oil spill in history, marking a significant change in the oil industry and safety standards thereafter. What data do we have on the Deepwater Horizon oil spill? BP leased the oil rig, however, it was owned and operated by an offshore company called Transocean. The drilling reached a depth of nearly 1 mile, at 5,000 ... » read more

Apple’s First GaN Charger
By Stephen Russell - 18 Nov, 2021 - Comments: 1

It has been heavily rumored and anticipated for a few years now, but we have finally seen Apple make the switch to using gallium nitride (GaN) as the power transistor in one of their charging products: the 140 W charger for the new 16-inch MacBook Pro. As has been the case with many innovations in the past, Apple may not be the first, but when they do adopt a technology people take notice! A... » read more

Why Mask Blanks Are Critical
By Mark LaPedus - 21 Oct, 2021 - Comments: 1

Geoff Akiki, president of Hoya LSI at the Hoya Group, sat down with Semiconductor Engineering to talk about optical and extreme ultraviolet (EUV) lithography as well as mask blanks. What follows are excerpts of that discussion. SE: Mask blanks are components that serve as the base or the substrate for a photomask. Why are they critical? Akiki: If you look at Hoya, we've been positioned as... » read more

The New Technology Solutions For Advanced SiP Devices
By YongJai Seo - 21 Oct, 2021 - Comments: 0

For many years, system-in-package (SiP) technology has been a focus for semiconductor packaging to address the ongoing market trend of system integration and size reduction. Today’s increased complexity and higher package density for SiP devices has driven the development of new packaging technologies. In response, compartmental shield technology makes it possible to put several functions int... » read more

Curvilinear Design Benefits For Wafers
By Jan Willis - 21 Oct, 2021 - Comments: 0

Throughout this blog series the focus has been on curvilinear photomasks – the benefits, enablers, and challenges. It leads to the obvious question that Aki Fujimura, CEO of D2S, put to the panel of luminaries. If leading-edge mask shops are ready for curvilinear shapes on mask enabled by curvilinear ILT, multi-beam mask writers and the mask design chain, can we have curvilinear target shapes... » read more

Evaluating The Impact Of STI Recess Profile Control On Advanced FinFET Performance
By Yu De Chen - 21 Oct, 2021 - Comments: 0

Profile variation is one of the most important problems during semiconductor device manufacturing and scaling. These variations can degrade both chip yield and device performance.  Virtual fabrication can be used to study profile variation in a very effective and economical manner and avoid process cycle time and wafer cost in the fab. In this short article, we will review the impact of STI (s... » read more

China’s IC Industry Revenue On Track to Top $250 Billion In 2025
By Kim Sin - 21 Oct, 2021 - Comments: 0

In the short span of a decade, China’s semiconductor sector has exploded to become one of the largest in the world and match the region’s prominence as the biggest consumer of chips. From 2015 to 2020 alone, revenue of China’s integrated circuit (IC) industry – consisting of IC design, IC manufacturing, and packaging and test – expanded at a rapid clip of 20% CAGR (RMB) to $128 billio... » read more

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