By Qingpeng Wang, Yu De Chen, Cheng Li, Rui Bao, Jacky Huang, and Joseph Ervin
Introduction
With continuing finFET device process scaling, micro loading control becomes increasingly important due to its significant impact on yield and device performance [1-2]. Micro-loading occurs when the local etch rate on a wafer is dependent upon existing feature sizes and local pattern density. Uninten...
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