Differences In The Lithographic Impact Of Particles On The Pellicle Surface Depending On Type Of EUV Mask Pattern


A new technical paper titled "Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types" was published by Hanyang University and Paul Scherrer Institute. Abstract "This study investigates the differences in the lithographic impact of particles on the pellicle surface depending on the type of extreme ultraviolet (EUV) mask pattern. Using a... » read more

New Materials Are in High Demand


Materials suppliers are responding to the intense pressures to improve power, performance, scaling, and cost issues, which follows a long timeline from synthesis to development and high volume manufacturing in fabs. The advances in machine learning help present a wide field of candidates, which engineers then narrow to potential use. When building standard logic semiconductor chips, the prim... » read more