Interference EUV lithography
ESOL has developed a standalone interference extreme ultraviolet (EUV) lithography tool for use in R&D applications.
The system, called EMiLE (EUV Micro-interference Lithography Equipment), is primary used to speed up the development of EUV photoresists and related wafer processes.
The system is different than ASML’s EUV lithography scanners, which are ...
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