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Standards for the Characterization of Endurance in Resistive Switching Devices


Abstract "Resistive switching (RS) devices are emerging electronic components that could have applications in multiple types of integrated circuits, including electronic memories, true random number generators, radiofrequency switches, neuromorphic vision sensors, and artificial neural networks. The main factor hindering the massive employment of RS devices in commercial circuits is related to... » read more

The Everything New Syndrome


Technology is all about the latest features, the fastest processing, with the lowest power. While that sounds great in marketing pitch, any or all of those factors don't necessarily equate to a better product or long-term user satisfaction. There's a reason semiconductor companies are conservative by nature. They want to know that when they spend tens or hundreds of millions of dollars on a ... » read more

Specialty Technologies Bring New Functionality


As a materials engineer, I am very proud of the fact that key advances in human civilization have been driven by materials innovation. The stone age, bronze age, and iron age were all essential steps in setting the human race on the path that we are on today. Innovations are not without their downsides, but they have enabled progress in agriculture, medicine, transportation, communication, a... » read more

Using Less Helium In Semiconductor Manufacturing


Helium gas is increasingly in short supply. While consumers may be most familiar with it for use in filling balloons, it is used much more heavily in a variety of industrial processes – including semiconductor fabrication. As a result of supply concerns, many companies, including Lam, are looking for ways to reduce their helium usage. The making of a semiconductor chip involv... » read more

Expanded Material Metrology For Refined Etch Selectivities


Trends in advanced device fabrication require combined lithography-etching multi-patterning sequences and self-aligned multi-patterning to form devices’ finest features at subwavelength dimensions. As EUV lithography (13.5 nm) progresses to larger numerical apertures and new thin resists, new multipatterning sequences must be developed with mutually compatible resists and proximal layers t... » read more

Robust Growth And Strong Outlook For Semiconductor Materials


2020 was a year that made a mark in the history of mankind as well as the semiconductor industry. It was a year of business and personal disruptions caused by COVID-19, supply chain interruptions, and exceptional agility of industries coping with the new normal imposed by the pandemic. Nevertheless, it was a year of extraordinary growth for the semiconductor industry, including semiconductor ma... » read more

Power Converter Chip Research Booms


Power electronics are booming, fueled by demand ranging from induction chargers for wearable and portable electronics, to charging stagings for electric vehicles. An estimated 80% of all U.S. electricity will pass through some form of power converter by 2030, said Yogesh Ramadass, director of power management at Texas Instruments' Kilby Labs. Transportation applications, in particular, deman... » read more

Learning properties of ordered and disordered materials from multi-fidelity data


Source: Chen, C., Zuo, Y., Ye, W. et al. Learning properties of ordered and disordered materials from multi-fidelity data. Nat Comput Sci 1, 46–53 (2021). https://doi.org/10.1038/s43588-020-00002-x Abstract: "Predicting the properties of a material from the arrangement of its atoms is a fundamental goal in materials science. While machine learning has emerged in recent years as a n... » read more

More Data, More Memory-Scaling Problems


Memories of all types are facing pressures as demands grow for greater capacity, lower cost, faster speeds, and lower power to handle the onslaught of new data being generated daily. Whether it's well-established memory types or novel approaches, continued work is required to keep scaling moving forward as our need for memory grows at an accelerating pace. “Data is the new economy of this ... » read more

Si Hardmask (Si-HM), EUV And Zero Defects


The multilayer system used in lithography consists of a planarizing carbon layer beneath a hardmask etch-transferring layer and capped with a standard photoresist coating. In the past, Brewer Science has discussed in-depth how the multilayer system helped to extend ArF (193 nm) immersion lithography to be able to print and transfer ever-shrinking features, ensuring enough process window especia... » read more

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