April 2017 - Page 4 of 11 - Semiconductor Engineering

The Evolution Of EUV
By Ed Sperling - 20 Apr, 2017 - Comments: 0

EUV systems are beginning to ship to large foundries in volume, setting the stage for one of the biggest leaps in technology the semiconductor industry has ever witnessed. ASML has emerged as the sole supplier in this market, but it has taken an entire ecosystem to develop EUV. It has taken billions of dollars of investment by ASML, along with enormous cash infusions by Intel and TSMC, contr... » read more

Sizing up China’s Fab Tool Biz
By Mark LaPedus - 20 Apr, 2017 - Comments: 0

China is pouring billions of dollars into its semiconductor industry and is building several new fabs. As reported, China is bolstering its IC industry for good reason. China is trying to reduce its huge trade imbalance in ICs. The country continues to import a large percentage of its chips from foreign vendors. Behind the scenes, China also continues to develop its domestic semiconductor eq... » read more

The Other Side Of H1-B Visas
By Katherine Derbyshire - 20 Apr, 2017 - Comments: 0

There is a lot of discussion these days about “Hire American.” But what does that actually mean in practice? I’m at the Materials Research Society Spring Meeting this week, where one of the presentations was by a scientist who works at the TEL Technology Center, America, in Albany, NY. It’s the largest Tokyo Electron research center outside of Japan. It’s affiliated with the SUNY P... » read more

Photoresist Shape In 3D
By Mustafa Akbulut - 20 Apr, 2017 - Comments: 0

Things were easy for integrators when the pattern they had on the mask ended up being the pattern they wanted on the chip. Multi-patterning schemes such as Self-Aligned Double Patterning (SADP) and Self-Aligned Quadruple Patterning (SAQP) have changed that dramatically. Now, what you have on the mask determines only a part of what you will get at the end. You will only obtain your final product... » read more

Will Self-Heating Stop FinFETs
By Katherine Derbyshire - 20 Apr, 2017 - Comments: 0

New transistor designs and new materials don’t appear out of thin air. Their adoption always is driven by the limitations of the incumbent technology. Silicon germanium and other compound semiconductors are interesting because they promise superior carrier mobility relative to silicon. [getkc id="185" kc_name="FinFET"] transistor designs help minimize short channel effects, a critical limi... » read more

SEMI Members Mobilize For 2017 SEMI Washington Forum
By Jamie Girard - 20 Apr, 2017 - Comments: 0

SEMI hosted 24 industry executives in Washington, DC on March 28 & 29 to take part in the annual SEMI Washington Forum. The Washington Forum, which is supported by SEMI’s North American Advisory Board (NAAB), gives SEMI member company executives a chance to come to the Nation’s capital for a firsthand experience in engaging policymakers on the issues that are pertinent to the industry. ... » read more

Understanding How Small Variations In Photoresist Shape Significantly Impact Multi-Patterning Yield
By Coventor - 20 Apr, 2017 - Comments: 0

Multi-patterning schemes such as Self-Aligned Double Patterning (SADP) and Self-Aligned Quadruple Patterning (SAQP) have been used to successfully increase semiconductor device density, circumventing prior physical limits in pattern density. However, the number of processing steps needed in these patterning schemes can make it difficult to directly translate a lithographic mask pattern to a fin... » read more

Inside Next-Gen Transistors
By Mark LaPedus - 20 Apr, 2017 - Comments: 0

David Fried, chief technology officer at [getentity id="22210" e_name="Coventor"], sat down with Semiconductor Engineering to discuss the IC industry, China, scaling, transistors and process technology. What follows are excerpts of that conversation. SE: In a recent roundtable discussion you talked about some of the big challenges facing the IC industry. One of your big concerns involves th... » read more

Moore’s Law: A Status Report
By Ed Sperling - 20 Apr, 2017 - Comments: 3

Moore's Law has been synonymous with "smaller, faster, cheaper" for the past 52 years, but increasingly it is viewed as just one of a number of options—some competing, some complementary—as the chip industry begins zeroing in on specific market needs. This does not make [getkc id="74" comment="Moore's Law"] any less relevant. The number of companies racing from 16/14nm to 7nm is higher t... » read more

Impact Of Rising SoC Design Costs On Innovation
By Rich Wawrzyniak - 20 Apr, 2017 - Comments: 0

If there is one truism in the semiconductor market, it is that rising costs will impact unit demand at some point if they continue long enough. The subject of this blog deals not with device ASPs; but rather with rising SoC design costs, and their effect on the number of designs at the advanced nodes. Even though the mechanism governing each set of numbers is different (device ASPs vs. design c... » read more

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