Fast Monte Carlo Simulations For Timing Variation Analysis


Process variations and device mismatches profoundly affect the latest ultra-small geometrical processes. Complexity creates additional factors that impact device manufacturing variability, which in turn impact overall yield. Monte Carlo (MC) simulations use repeated random sampling to relate process variations to circuit performance and functionality, thus determining how they impact yield. How... » read more

Apple CPU Attacks: SLAP and FLOP (Georgia Tech, Ruhr University Bochum)


Two technical papers were published by researchers at Georgia Tech and Ruhr University Bochum detailing CPU side-channel attack vulnerabilities on Apple devices that could reveal confidential data. FLOP: Breaking the Apple M3 CPU via False Load Output Predictions"  Authors: Jason Kim, Jalen Chuang, Daniel Genkin and Yuval Yarom 2025. "We present FLOP, another speculative execution att... » read more

Ultranarrow Semiconductor WS2 Nanoribbon FETs (Chalmers)


A new technical paper titled "Ultranarrow Semiconductor WS2 Nanoribbon Field-Effect Transistors" was published by researchers at Chalmers University of Technology. Abstract "Semiconducting transition metal dichalcogenides (TMDs) have attracted significant attention for their potential to develop high-performance, energy-efficient, and nanoscale electronic devices. Despite notable advancem... » read more

Topology And Connection Architecture Of CXL Pooling Systems (Microsoft, Columbia)


A new technical paper titled "Octopus: Scalable Low-Cost CXL Memory Pooling" was published by researchers at University of Washington, Microsoft Azure and Columbia University. Abstract "Compute Express Link (CXL) is widely-supported interconnect standard that promises to enable memory disaggregation in data centers. CXL allows for memory pooling, which can be used to create a shared memory ... » read more

Controlling Speckle Contrast Using Existing Lithographic Scanner Knobs to Understand LWR (Samsung, ASML)


A new technical paper titled "Controlling Speckle Contrast Using Existing Lithographic Scanner Knobs to Explore the Impact on Line Width Roughness" was published by researchers at Samsung, ASML and Sungkyunkwan University. Abstract "Local critical dimension uniformity (LCDU) or line width roughness (LWR) is increasingly important in argon fluoride (ArF) immersion lithography systems (scanne... » read more

Blog Review: Jan. 29


Cadence's Reela Samuel looks beyond silicon to new semiconductor materials under development and the particular applications for gallium nitride, silicon carbide, indium phosphide, glass, and diamond. Siemens' Kyle Fraunfelter and Melville Bryant find that lean approaches alone cannot address the increasingly complex sustainability challenges of semiconductor manufacturing and call for the e... » read more

Advanced Packaging Moving At Breakneck Pace


Experts at the Table: Semiconductor Engineering sat down to discuss advances in packaging with Michael Kelly, vice president of Chiplets and FCBGA Integration at Amkor; William Chen, fellow at ASE; Dick Otte, CEO of Promex Industries; and Sander Roosendaal, R&D director at Synopsys Photonics Solutions. What follows are excerpts of that discussion. [Part 2 of the discussion is here.] ... » read more

The Digital Twin Technology Applied to 6G Communication


This paper provides a comprehensive overview of digital twin technology, starting with its definition as a dynamic virtual representation of physical systems. Furthermore, we distinguish between simulators and digital twins, highlighting their key differences and characteristics particularly related to the interactions with real-time data. The paper also delves into the evolution of digital ... » read more

Improving Uniformity And Linearity For All Masks


When it comes to mask quality, there are two vital measurements: uniformity and linearity. Uniformity measures the consistency of the size of mask features in all occurrences across the entire mask, because different instances of the same target size can vary in size due to manufacturing variation. Linearity measures how well different sizes of shapes on the manufactured mask match their target... » read more

Research Bits: Jan. 28


Optical memory unit Researchers from Nokia Bell Labs developed a new type of optical memory called a programmable photonic latch that enables temporary data storage in optical processing systems. It is modeled after a set-reset latch. The integrated programmable photonic latch is based on optical universal logic gates using silicon photonic micro-ring modulators and can be implemented in co... » read more

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