category: Manufacturing Solutions

category: Auto, Security & Edge AI

A New Fracture Engine For Curvilinear Masks And MULTIGON Mask Data
By Travis Brist - 18 Jun, 2026 - Comments: 0

Curvilinear masks are rapidly moving into high-volume production. This transition is driven by the need for better pattern fidelity, larger wafer process windows, and more effective use of inverse lithography technology (ILT) and curvilinear optical proximity correction (OPC). However, curvilinear masks also create a new challenge for mask data preparation (MDP): when curvilinear MULTIGON patte... » read more

Beyond Ideal Crystals: The Case For Scale In Atomistic Modeling
By Anders Blom - 21 May, 2026 - Comments: 0

Almost all computer simulations face the same trade-off: larger models can be more realistic and therefore more useful, but they also take longer to run. Engineers and scientists are therefore faced with an almost daily challenge of choosing a model that is detailed enough to capture the important details without making the calculation impractically expensive. "All models are wrong, but some... » read more

Automate And Speed Up TCAD Calibration With Expert Modules And ML Calibration Accelerator
By Saurabh Suryavanshi - 16 Apr, 2026 - Comments: 0

Increasing complexity in semiconductor manufacturing has pushed the time to market and R&D costs significantly higher. In the world of AI, there is increased focus on efficiency to help address these issues simultaneously. Wafer-based learning, which is an iterative and linear process, is a key contributor to the increased semiconductor development time and cost. Technology computer-aided d... » read more

Exploring The Frontiers Of Lithography And Patterning: Highlights From SPIE Advanced Lithography + Patterning 2026
By Travis Brist - 19 Mar, 2026 - Comments: 0

Leading‑edge system-on-chip (SoC) designs at deep submicron nodes are stretching lithography and patterning capabilities across the entire manufacturing flow. Extreme ultraviolet (EUV) lithography has become central to printing advanced features, using high‑power pulsed lasers to generate a plasma light source and reflective optics to project mask patterns onto the wafer. As error budgets t... » read more

Force Fields Will Accelerate Atomistic Simulations By 10,000× In 2026, Unlocking New Era Of Discovery
By Anders Blom - 19 Feb, 2026 - Comments: 0

By Anders Blom and Igor Markov “Force fields” have long captured our imagination — the invisible shields of science-fiction lore that protect starships and superheroes from harm. But in the world of scientific discovery, force fields play a much different role: They are mathematical models that let us peer into the atomic heart of matter itself. Now, thanks to breakthroughs in artif... » read more

Faster Mask Synthesis With GPUs
By Travis Brist - 18 Dec, 2025 - Comments: 0

Design teams face rising pressure to deliver larger chips with higher transistor densities on tighter schedules using advanced node processing. The computing demands of modern applications, especially those making heavy use of AI, are extending pressure beyond design to every step of the development flow, including manufacturing, where photolithography and mask synthesis must keep pace. This po... » read more

Adding Cost, Cycle Time, And Carbon Footprint To PPA Design Targets
By Shela Aboud - 20 Nov, 2025 - Comments: 0

When engineers start designing a new semiconductor technology and fabrication process, they set targets to define what they are trying to achieve to meet the market demands and beat competitive offerings. Traditionally, they have used the metrics of power, performance, and area (PPA). This post examines how additional design targets are mandated by today’s deep submicron nodes and how develop... » read more

Charting The Frontiers Of Photomask Technology And Extreme Ultraviolet Lithography
By Travis Brist - 23 Oct, 2025 - Comments: 0

The enormous computing demands of AI and high-performance computing (HPC) applications are putting intense pressure on every aspect of chip development. Challenges arise during architecture, design, and verification, persist through the manufacturing process, and extend to post-silicon lifecycle management as chips are deployed in the field. Lithography, the fabrication step of shining light... » read more

Quantum Computing: How Advances May Reshape Our Understanding Of The World
By Greg Sorber - 18 Sep, 2025 - Comments: 0

After decades spent gestating in labs, quantum computing has finally reached an inflection point between theoretical promise and practical implementation. From discoveries in pharmaceutical and material sciences to boosting artificial intelligence (AI) and climate modeling, quantum computing is on the cusp of providing an entirely new way to solve highly complex problems — which could ultimat... » read more

Materials Modeling Of Superconducting Qubits In Quantum Computers
By Anders Blom - 21 Aug, 2025 - Comments: 0

While the concept of quantum computing has been discussed for more than 40 years, only recently have experiments indicated that a practical quantum computer may be possible. Recent developments in this area have captured headlines with dramatic claims—and equally dramatic rebuttals. Google’s Willow chip demonstrated error-corrected operations in late 2024, while D-Wave’s assertion of quan... » read more

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