GPU Acceleration Of Rigorous Lithography Simulations

By Wolfgang Demmerle - 24 Jul, 2025 - Comments: 0

Producing modern semiconductor devices is an immensely challenging process. Successful execution entails advanced process nodes, novel device architectures, new materials, and many fabrication steps. One especially challenging area is lithography, in which light is sent through a photomask, passes through a projection system of lenses and mirrors, and strikes the substrate to create the device ... » read more

Metrology Analysis Tool For Photolithography Process Characterization At Advanced Nodes

By Wolfgang Demmerle - 23 Jul, 2024 - Comments: 0

Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers are using single-digit nanometer figures or even Angstrom to label their manufacturing technology nodes, which are associated with the size of features patterned during the lithography process. ... » read more