Enabling Production-Ready AI For Semiconductor Manufacturing


Semiconductor inspection has always been a scalability problem. Inspection teams are buried in manual reviews because the machines on the line throw false rejects, miss real defects, and can't learn from the data they're already producing. The job hasn't really changed in decades. Find defects faster. Find them with higher sensitivity. Keep cost down. And whatever you do, don't bury the review ... » read more

eBeam Initiative At SPIE ALP 2026: Continuing Progress On Curvilinear, EUV, And Data Challenges


The eBeam Initiative’s annual lunch at SPIE Advanced Lithography and Patterning has long served as a focal point for eBeam technology education for the industry. This year marked our 17th gathering, with approximately 150 attendees joining us. As in past years, the value of the session was less about any single topic and more about the collective signal across different parts of the ecosystem... » read more

Expert Panel Sees History Of Continuous Photomask Innovations As Key To The Future


The eBeam Initiative conducted its 14th annual eBeam Initiative Luminaries survey in July and reported the results on September 23, 2025 to more than 200 attendees at its annual meeting during the BACUS SPIE Photomask Technology conference. Industry luminaries representing 51 companies from across the semiconductor ecosystem—including photomasks, electronic design automation (EDA), chip desig... » read more

40th EMLC Honors Three Decades Of Vision From Dr. Uwe Behringer


The European Mask Lithography Conference (EMLC), an annual event that brings together researchers from around the world to present the latest findings on photomask and lithography technology, returned to Dresden from June 16 to June 18, 2025, and took place for the 40th time – marking a memorable anniversary combined with a premiere. For over 30 years, Dr. Uwe Behringer shaped the conference ... » read more

Variable Bias Completes The PLDC Model And Offers Superior MPC Results


This is the third in a three-blog series on PLDC. The first installment was “Improving Uniformity and Linearity for All Masks,” from January 29, 2025. The second blog was “Three Ways Curvy ILT Together with PLDC Improves Wafer Uniformity,” from April 18, 2025. In 2024, the eBeam Initiative Luminaries Survey found that the number one concern in adoption of curvilinear mask features wa... » read more

Photomask Japan 2025: A Strong Signal For The Future Of Our Industry


Photomask Japan (PMJ) 2025 was, without a doubt, the most exciting edition I’ve attended in recent years. From a surge in attendance to a packed agenda full of technical depth and forward-looking insights, this year’s event reflected the growing momentum and innovation across the photomask and eBeam ecosystem. Let’s start with the numbers—624 attendees. That’s a significant jump fr... » read more

Three Ways Curvy ILT Together With PLDC Improves Wafer Uniformity


This is the second blog in a three-part series on pixel-level dose correction (PLDC). The first installment was “Improving Uniformity and Linearity for All Masks” from January 29, 2025. PLDC: A new solution for improving mask and wafer uniformity Improving mask uniformity is the easiest, cheapest way to improve wafer uniformity. Uniformity is a measure of how similarly the exact same feat... » read more

Reflecting On The SPIE Advanced Lithography + Patterning Symposium 2025


The mood at this year’s SPIE Advanced Lithography + Patterning Symposium was decidedly upbeat. The outlook for business is good, due in large measure to expectations of high demand for chips, driven by artificial intelligence (AI). To realize the potential of AI, increases in chip performance and efficiency are needed, which, in turn, requires advanced patterning. In the Symposium’s technic... » read more

Improving Uniformity And Linearity For All Masks


When it comes to mask quality, there are two vital measurements: uniformity and linearity. Uniformity measures the consistency of the size of mask features in all occurrences across the entire mask, because different instances of the same target size can vary in size due to manufacturing variation. Linearity measures how well different sizes of shapes on the manufactured mask match their target... » read more

Takeaways From The 2024 SPIE Photomask Technology + EUV Conference


In the autumn, I had the opportunity to attend the 2024 SPIE Photomask Technology and EUV Lithography conferences, collectively referred to as PUV or sometimes BACUS, the latter a reference to the event’s early association with the BACUS organization. This is a key annual event that brings together experts and professionals in photomask technology and EUV lithography. This year’s conference... » read more

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