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In The Spotlight: What Is Responsible For The Surging Demand For CIS?


After TSMC announced plans to construct a new fab in Arizona, the Taiwan-based company disclosed that they are considering building new fabs in Japan and Germany. While the Arizona fab will focus on producing 5nm nodes using extreme ultraviolet lithography (EUV) technology, the new plant in Japan reportedly would focus on the 28nm node. This 28nm fab in Japan would be in addition to a 28nm fab ... » read more

Reducing Rework In CMP: An Enhanced Machine Learning-Based Hybrid Metrology Approach


By Vamsi Velidandla, John Hauck, Zhuo Chen, Joshua Frederick, and Zhihui Jiao The semiconductor industry is constantly marching toward thinner films and complex geometries with smaller dimensions, as well as newer materials. The number of chemical mechanical planarization (CMP) steps has increased and, with it, a greater need for within-wafer uniformity and wafer-to-wafer control of the thin... » read more

What Does It Take To Build A Successful Multi-Chip Module Factory?


When it comes to multi-chip module (MCM) manufacturing, fan-out wafer-level and fan-out panel-level packaging have received a lot of coverage recently. Every week, it seems like there is an announcement about “Company XYZ” moving their products into the fan-out wafer-level packaging (FOWLP) or fan-out panel-level packaging (FOPLP) space. But these moves come with challenges that didn’t ex... » read more

Expanded Material Metrology For Refined Etch Selectivities


Trends in advanced device fabrication require combined lithography-etching multi-patterning sequences and self-aligned multi-patterning to form devices’ finest features at subwavelength dimensions. As EUV lithography (13.5 nm) progresses to larger numerical apertures and new thin resists, new multipatterning sequences must be developed with mutually compatible resists and proximal layers t... » read more

Understanding Optical Inspection For CIS


The demand for smartphone cameras, video conferencing, surveillance and autonomous driving has fueled explosive growth of CMOS image sensor (CIS) manufacturing in the last decade. While CIS becomes an increasingly important element in the production of today’s consumer electronics, there are unique challenges in production that must be addressed. As pixel sizes shrink, we see an inverse relat... » read more

How Do Machines Learn?


We depend, or hope to depend, on machines, especially computers, to do many things, from organizing our photos to parking our cars. Machines are becoming less and less "mechanical" and more and more "intelligent." Machine learning has become a familiar phrase to many people in advanced manufacturing. The next natural question people may ask is: How do machines learn? Recognizing diverse obje... » read more

Untangling 3D NAND: Tilt, Registration, And Misalignment


The multiple demands of 3D NAND to enable yield and performance increase in difficulty at each generation. First generation devices, at 24-32 layer pairs, pushed process tools to extremes, going quickly from 10:1 to 40:1 aspect ratios for today’s 64-96 pair single tier devices. The aspect ratios increased as fast as the manufacturing challenges. To continue bit density scaling, processing imp... » read more

Demystifying ADC


ADC stands for automatic defect classification. It’s a software that classifies defects based on image and metadata such as location, ROI, and other information associated with a defect. ADC is not a mysterious black box that’s impossible to understand. Instead, ADC classifies defects the same way a human operator does, by first being trained by an expert. Then, just like human classificati... » read more