A look at the challenges and various solutions using LELE at 20nm, including place and route effects, OPC and mask misalignment and image rounding.
Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers. We discuss the unique design and process characteristics of LELE DP, the challenges they present, and various solutions, including:
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