Using ML and neural networks for automatic spatial pattern detection.
Searching through wafer maps looking for spatial patterns is not only a very time-consuming task to be done manually, it’s also prone to human oversight and error, and nearly impossible in a large fab where there are thousands of wafers a day being processed.
We developed a tool that applies automatic spatial pattern detection algorithms using ML, parametrizing pattern recognition and classification algorithms to work in a semiconductor manufacturing environment.
Read more here.
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