Reticle Inspection And Metrology

Thirty seven years later, much has changed in a field many of us take for granted.


Pattern defects and contamination on a reticle can cause yield issues in every die of every wafer printed. We take it for granted today, but it started out with people looking through a microscope and manually scrolling back and forth looking for defects on photomasks that originally were hand cut, and later on made by machines.

Fast forward to the present and we’re able to find the equivalent of a grain of rice in a the city of San Francisco.

Here’s an interesting video to show just how far we’ve progressed:

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