Manufacturing Bits: Feb. 18

Molecular layer etch The U.S. Department of Energy’s Argonne National Laboratory has made new advances in the field of molecular layer etching or etch (MLE). MLE is related to atomic layer etch (ALE). Used in the semiconductor industry, ALE selectively removes targeted materials at the atomic scale without damaging other parts of the structure. ALE is related to atomic layer deposition... » read more

Manufacturing Bits: March 26

ALD materials database Atomic Limits, a blog site that addresses atomic-level processing technologies, has developed an online database listing all atomic layer deposition (ALD) materials and processes. The database could be useful for ALD processes in semiconductors and other fields. ALD is a deposition technique that deposits materials one layer at a time. In ALD systems, wafers are place... » read more

Manufacturing Bits: Aug. 15

Self-collapse lithography The University of California at Los Angeles (UCLA) has developed a technology called self-collapse lithography. The technology, reported in the journal Nano Letters, resembles the combination of nanoimprint, selective removal and a chemical lift-off process. More specifically, though, the technology provides insights into patterning using a chemical lift-off lith... » read more