Patterning 1nm features
The Center for Functional Nanomaterials (CFN) at the Brookhaven National Laboratory has patterned features down to 1nm using a direct-write lithography technique.
Using a scanning transmission electron microscope (STEM), researchers have patterned thin films of the polymer poly(methyl methacrylate), or PMMA, down to 1nm with a spacing between features at 11nm.
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