Manufacturing Bits: May 2

Patterning 1nm features The Center for Functional Nanomaterials (CFN) at the Brookhaven National Laboratory has patterned features down to 1nm using a direct-write lithography technique. Using a scanning transmission electron microscope (STEM), researchers have patterned thin films of the polymer poly(methyl methacrylate), or PMMA, down to 1nm with a spacing between features at 11nm. Re... » read more