Curvilinear Mask Patterning For Maximizing Lithography Entitlement


Curvilinear Mask Patterning is a cutting-edge lithography technique that promises to maximize lithography entitlement by addressing complex design challenges and critical yield limiters. However, its widespread deployment has been limited by significant computational challenges. This paper includes practical solutions to overcome the computational challenges associated with this technique, as w... » read more

Curvilinear Photomasks Can Be Made Today


Multi-beam mask writers (MBMWs) and GPU-accelerated curvilinear ILT are enabling curvilinear photomasks to be made today. Despite the benefits of improved process windows, curvilinear photomask adoption is slow. Industry luminaries surveyed by the eBeam Initiative in 2021 ranked photomask inspection and infrastructure as the top barriers to adoption, as shown in figure 1. Yet only 4% say the b... » read more