eBeam Initiative Marks Major Milestones Over 15 Years Of Photomasks And Lithography


The eBeam initiative celebrated its 15th anniversary at the recent SPIE Advanced Lithography + Patterning Conference. 130 members of the mask and lithography community attended the annual lunch to mark the milestone. The eBeam Initiative welcomed its 53rd member, FUJIFILM Corporation, having grown from 20 members and advisors at its launch. FUJIFILM is the first company from the chemical supply... » read more

Why Curvy Design Now? Manufacturing Is Possible And Scaling Needs It


Have you ever seen roots or tree branches take a 90-degree turn? Have you ever seen a river that takes a 90-degree turn? Nature doesn’t do 90-degree turns, or for that matter any sharp angle turns – not even 135 degrees. Yet the entire chip-design infrastructure is based on the Manhattan assumption of 90-degree turns. While it would take time to change, is there any doubt that a curvilinea... » read more