Tame IR Drop Like Google


In the relentless pursuit of semiconductor performance and efficiency, tech giants like Google are constantly pushing the boundaries of what's possible. As they scale their designs to the cutting-edge 3nm node, power integrity has emerged as a critical challenge that must be overcome. Enter Calibre DesignEnhancer (DE), Siemens' analysis-based solution for enhancing design reliability and man... » read more

Calibre DesignEnhancer Design-Stage Layout Modification Improves Power Management Faster And Earlier


In today’s IC designs, effective power management through layout optimization is crucial for achieving PPA targets. This paper, written by Jeff Wilson, describes how the Calibre DesignEnhancer platform, is used to specifically tackle the EMIR components of power management. DesignEnhancer offers P&R and custom/analog design teams a fast, integrated environment for implementing Calibre-cle... » read more

Enhancing Power Reliability Through Design-Stage Layout Optimization


As integrated circuit (IC) designs continue to scale, the demand for efficient power management, performance optimization and reliable physical layout modification grows more critical. Meeting these power, performance and area (PPA) targets is essential for ensuring that IC designs operate effectively at advanced process nodes. One of the main challenges for design and verification engineers is... » read more

Impact Of GAA Transistors At 3/2nm


The chip industry is poised for another change in transistor structure as gate-all-around (GAA) FETs replace finFETs at 3nm and below, creating a new set of challenges for design teams that will need to be fully understood and addressed. GAA FETs are considered an evolutionary step from finFETs, but the impact on design flows and tools is still expected to be significant. GAA FETs will offer... » read more