Photomasks are becoming more complex and expensive at each node, thereby creating a number of challenges on several fronts.
For one thing, the features on the [getkc id="265" kc_name="photomask"] are becoming smaller and more complex at each node. Second, the number of masks per mask-set are increasing as a result of multiple patterning. Third, it costs more to build and equip a new mask fab...
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