ArterisIP’s Kurt Shuler looks at what can go wrong in automotive design, what are the prerequisites for getting the attention of Tier 1 and OEMs, and what’s involved in automotive design at all levels.
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Rising complexity is changing the way companies engage and interact, but long-standing barriers in communication, culture, and IP protection are slowing progress.
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Alongside high-NA EUV will be better-performing photoresists, reduced roughness using passivation and etch, and lateral etching to reduce tip-to-tip dimensions.
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