Manufacturing Bits: June 8


Maskless EUV lithography At this week’s 2020 EUVL Workshop, KJ Innovation will present more details about its efforts to develop a maskless extreme ultraviolet (EUV) lithography technology. Still in R&D, KJ Innovation’s maskless EUV technology involves a high-numerical aperture (high-NA) system with 2 million individual write beams. The 0.55 NA technology is targeted for direct-write l... » read more

Manufacturing Bits: Jan. 10


Atom interferometers The Massachusetts Institute of Technology (MIT) has devised one of the world’s most accurate atom interferometers. Interferometry is a common measurement technique. Basically, the technology looks at electromagnetic waves. The waves are superimposed to extract information. One interferometry technology type, called an atom interferometer, utilizes the waves of ato... » read more