Double Patterning From Design Enablement To Verification


Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers. We discuss the unique design and process characteristics of LELE DP, the challenges they present, and various solutions, including: DP design methodologies, current DP conflict feedback mechanisms, and how they can help designers identify and resolve conflicts. E... » read more

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