We Have Reached The Tipping Point For Simulation-Based Mask Data Preparation

Since the beginning of the semiconductor industry, mask-data preparation (MDP) and mask verification (MV) have been shape-based: each shape has been treated as an entity unto itself, and if each isolated shape was correct, the mask was correct. This context independence is a critical assumption for conventional fracturing. However, as line/space measurements (L:S) fall below 50nm, shape-ba... » read more