Optimal Surface Condition For Improved Cu-to-Cu Direct Bonding (NCHU, Osaka Univ.)


A new technical paper titled "Hybrid surface pre-treatments for enhancing copper-to-copper direct bonding" was published by researchers at National Chung Hsing University (NCHU) and Osaka University. Abstract excerpt "Three-dimensional integrated circuits (3D IC) require low-temperature, high-reliability Cu–Cu direct bonding to support fine-pitch vertical interconnects and heterogeneous... » read more

Flat-surface-assisted and self-regulated oxidation resistance of Cu(111)


Abstract "Oxidation can deteriorate the properties of copper that are critical for its use, particularly in the semiconductor industry and electro-optics applications. This has prompted numerous studies exploring copper oxidation and possible passivation strategies. In situ observations have, for example, shown that oxidation involves stepped surfaces: Cu2O growth occurs on flat surfaces as a ... » read more