How Curvilinear Mask Writing Affects Chip Design

By Ed Sperling - 12 Apr, 2023 - Comments: 0

As chips become more complex and features continue to shrink, it becomes more difficult to print shapes on photomasks. The ability to print curvilinear masks changes that equation, but not all of the pieces in the flow are automated today. Aki Fujimura, CEO of D2S, talks about what has to change, what will the impact be on design rules, and why using curvilinear shapes can shrink the manufactur... » read more

Deep Learning (DL) Applications In Photomask To Wafer Semiconductor Manufacturing

By eBeam Initiative - 15 Mar, 2023 - Comments: 0

Published by the eBeam Initiative Member Companies (February 2023), this list of artificial intelligence (AI) systems used by member companies in their semiconductor manufacturing products shows progress. New examples of systems using AI include: image processing and parameter tuning in lithography tool mask metrology system B-SPline Control Point generation tool sem... » read more

Multi-Beam Mask Writers Are A Game Changer

By Jan Willis - 22 Dec, 2022 - Comments: 0

The eBeam Initiative’s 11th annual Luminaries survey in 2022 reported strong purchasing predictions for multi-beam mask writers, enabling both EUV and curvilinear photomask growth. A panel of experts debated remaining barriers to curvilinear photomask adoption during an event co-located with the SPIE Photomask Technology Conference in late September. Industry luminaries representing 44 compan... » read more

Increased Photomask Density And Its Impact On EDA

By Ed Sperling - 13 Dec, 2022 - Comments: 0

The ability to print curvilinear shapes on photomasks can have big repercussions on semiconductor design. Aki Fujimura, CEO of D2S, explains why mask rule checking has been bound by complex design rules, and why curvilinear shapes are important for reducing margin and simplifying the chip design process. » read more

High-NA EUV Complicates EUV Photomask Future

By Jan Willis - 17 Nov, 2022 - Comments: 0

The eBeam Initiative’s 11th annual Luminaries survey in 2022 reported EUV fueling growth of the semiconductor photomask industry while a panel of experts cited a number of complications in moving to High-NA EUV during an event co-located with the SPIE Photomask Technology Conference in late September. Industry luminaries representing 44 companies from across the semiconductor ecosystem partic... » read more

Why Changes In Computing Are Driving Changes In Photomasks

By Ed Sperling - 18 Oct, 2022 - Comments: 0

Aki Fujimura, CEO of D2S, talks with Semiconductor Engineering about massive improvements in computation based upon increased density on chips, and why printing Manhattan shapes on a photomask are no longer sufficient to print high-performance devices with predictable reliability every time. He explains why a discontinuity in EDA physical design has opened the door for printing curvilinear shap... » read more

Attenuated Phase Shift Masks (attPSM) For EUV (Fraunhofer IISB)

By Technical Paper Link - 08 Jul, 2022 - Comments: 0

New research paper titled "Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?," from researchers at Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany). Aim: "We review published research on attenuated phase shift masks (attPSM) for EUV with special emphasis on modeling and fundamental understanding of the ... » read more

For The Love Of Theatre And Mask-Making

By Jan Willis - 05 Jul, 2022 - Comments: 0

Naoya Hayashi has been a friend and important contributor to the eBeam Initiative from our start over 13 years ago. We’re just one of the many interests he has embraced and championed over his 45 year career at DNP. Now it’s our turn to embrace him and thank him for the wonderful memories as he pursues his next chapter after retiring as the first research fellow from DNP this June. Aki Fuji... » read more

The Changing Mask Landscape

By Jan Willis - 19 May, 2022 - Comments: 0

Semiconductor photomasks have undergone some major technology changes in the past few years after relatively minor changes for many years. New technologies such as multi-beam mask writers and extreme ultraviolet (EUV) lithography are major breakthroughs as they ramp into high-volume manufacturing. A new trend related to these technologies is the use of curvilinear features on photomasks. Aki... » read more

Using GPUs In Semiconductor Manufacturing

By Ed Sperling - 25 Apr, 2022 - Comments: 0

Massive simulation and curvilinear shapes are forcing the photomask industry to rethink what types of chips work best. Aki Fujimura, CEO of D2S, talks about what happens when shapes printed on a mask are closer to what actually gets printed, how GPUs can be used to accelerate CPUs in single instruction/multiple data (SIMD) operations, and why pixel data is different from other data. » read more

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tag: photomasks