Improving Uniformity And Linearity For All Masks


When it comes to mask quality, there are two vital measurements: uniformity and linearity. Uniformity measures the consistency of the size of mask features in all occurrences across the entire mask, because different instances of the same target size can vary in size due to manufacturing variation. Linearity measures how well different sizes of shapes on the manufactured mask match their target... » read more

Making And Protecting Advanced Masks


Semiconductor Engineering sat down to discuss lithography and photomask trends with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at Photronics; Thomas Scheruebl, director of strategic business development and product strategy at Zeiss; Noriaki Nakayamada, senior technologist at NuFlare; and Aki Fujimura, chief executive of D2S. What fol... » read more