This is the third in a three-blog series on PLDC. The first installment was “Improving Uniformity and Linearity for All Masks,” from January 29, 2025. The second blog was “Three Ways Curvy ILT Together with PLDC Improves Wafer Uniformity,” from April 18, 2025.
In 2024, the eBeam Initiative Luminaries Survey found that the number one concern in adoption of curvilinear mask features wa...
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