Chip Industry Technical Paper Roundup: June 30


New technical papers recently added to Semiconductor Engineering’s library: Technical Paper Research Organizations PuDGhost: Experimental Analysis of Computation Result Corruption in Processing-using-DRAM Operations on Real DRAM Chips and Implications for Future Systems 🔗 The University of Tokyo, ETH Zurich, CISPA, RIKEN Recent Progress in Atomic-Scale Contr... » read more

Advancements In Atomic-Scale Plasma Processing


Researchers from Nagoya University, Boise State University, Korea Institute of Fusion Energy, Hitachi High-Tech Corp. and Princeton Plasma Physics Laboratory published a technical paper titled “Recent Progress in Atomic-Scale Controlled Plasma Processing.” Abstract Excerpt: “Atomic-scale control in plasma processing is becoming increasingly critical for fabricating of advanced semic... » read more

Research Bits: June 9


InGaOx GAA transistor Researchers from the University of Tokyo created a gate-all-around transistor made from gallium-doped indium oxide (InGaOx). Doping indium oxide with gallium suppressed oxygen vacancies, improving transistor reliability. "We wanted our crystalline oxide transistor to feature a 'gate-all-around' structure, whereby the gate, which turns the current on or off, surrounds t... » read more

Research Bits: Feb. 10


Speeding up 3D NAND etch Researchers from Lam Research, the University of Colorado Boulder, and Princeton Plasma Physics Laboratory (PPPL) investigated ways to speed up the cryogenic reactive ion etching process for 3D NAND by using a combined hydrogen fluoride gas to create the plasma. “Cryo etch with the hydrogen fluoride plasma showed a significant increase in the etching rate compared... » read more

Research Bits: July 16


Kirigami-inspired mechanical computer Researchers from North Carolina State University developed a kirigami-inspired mechanical computer that uses a complex structure of rigid, interconnected polymer cubes to store, retrieve, and erase data without relying on electronic components. The system uses 1-centimeter plastic cubes, grouped into functional units consisting of 64 interconnected cubes. ... » read more

Research Bits: July 11


Modeling ALE Scientists at U.S. Department of Energy’s (DOE) Princeton Plasma Physics Laboratory (PPPL), in coordination with Lam Research, modeled atomic layer etching (ALE) for semiconductor fabrication. “This would be one little piece in the whole process,” said David Graves, associate laboratory director for low-temperature plasma surface interactions at PPPL and a professor in th... » read more