Using Graph Attention for Virtual Metrology in Semiconductor Manufacturing (Intel Foundry, ASU)


Researchers from Arizona State University and Intel Foundry have published “Graph Attention-Based Virtual Metrology for Film Deposition Processes in Semiconductor Manufacturing”. Abstract “Artificial intelligence-driven semiconductor manufacturing increasingly operates at nanometer and angstrom scales, where precise process control depends on accurate and timely metrology. Howeve... » read more

Process Window Optimization Of DRAM By Virtual Fabrication


New integration and patterning schemes used in 3D memory and logic devices have created manufacturing and yield challenges. Industrial focus has shifted from the scaling of predictable unit processes in 2D structures to the more challenging full integration of complex 3D structures. Conventional 2D layout DRC, offline wafer metrology, and offline electrical measurements are no longer sufficient... » read more