More Photons Are Good


By Michael P.C. Watts Scatterometry is the favored approach to monitor complex 3D nano-structures in production. At SPIE Advanced Lithography, KLA introduced a new generation of their scatterometry metrology system. The new system expands the number of different measurements; know internally as multi-multi-multi. Scatterometry relies on measuring the diffraction patterns from a test diffr... » read more

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