Managing Yield With EUV Lithography And Stochastics

By Katherine Derbyshire - 18 May, 2023 - Comments: 1

Identifying issues that actually affect yield is becoming more critical and more difficult at advanced nodes, but there is progress. Although they are closely related, yield management and process control are not the same. Yield management seeks to maximize the number of functioning devices at the end of the line. Process control focuses on keeping each individual device layer within its des... » read more

Looking Forward To SPIE, And Beyond

By Katherine Derbyshire - 16 Feb, 2023 - Comments: 0

On the eve of this year’s SPIE Advanced Lithography + Patterning conference, I took a look at the IEEE Devices and Systems Roadmap’s lithography section. It’s especially notable for the emergence of EUV lithography, which has quickly become critical for advanced logic. High-NA tools to support still smaller dimensions are on the horizon. In the near-term, though, the key challenge is not ... » read more

Mapping The Future Of Lithography

By Harry Levinson - 16 Feb, 2023 - Comments: 0

The SPIE Advanced Lithography + Patterning (AL+P) Symposium is always an informative event for lithographers, and looking at the Advance Program, it appears that AL+P 2023 will be no exception. The progress being made on key lithographic challenges is consistently of interest to attendees, and there will be many timely presentations that address issues of current significance. For example, r... » read more

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tag: SPIE Advanced Lithography + Patterning

Managing Yield With EUV Lithography And Stochastics

Looking Forward To SPIE, And Beyond

Mapping The Future Of Lithography

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