EUV Lithography: The Resolution Capability And Stochastic Behavior From Statistical Viewpoints


A new technical paper titled "Statistics of EUV exposed nanopatterns: Photons to molecular dissolutions" was published by Hiroshi Fukuda, Hitachi High-Tech Corporation. Abstract "For higher computing power of semiconductor integrated circuits, pattern feature sizes below 10 nm are anticipated by introducing extreme ultraviolet (EUV) lithography with high numerical aperture (NA) optics. Ho... » read more

FPGAs: Automated Framework For Architecture-Space Exploration of Approximate Accelerators


A technical paper titled "autoXFPGAs: An End-to-End Automated Exploration Framework for Approximate Accelerators in FPGA-Based Systems" was published (preprint) by researchers at TU Wien, Brno University of Technology, and NYUAD. Abstract "Generation and exploration of approximate circuits and accelerators has been a prominent research domain exploring energy-efficiency and/or performance... » read more