High-NA EUV Lithography: Enhancing Resolution By Split Pupil Exposure (Fraunhofer, ASML)


A new technical paper titled "Resolution enhancement for high-numerical aperture extreme ultraviolet lithography by split pupil exposures: a modeling perspective" was published by researchers at Fraunhofer IISB and ASML. The open source paper published on SPIE states: "The lithographic imaging performance of extreme ultraviolet (EUV) lithography is limited by the efficiency of light diffrac... » read more

Power/Performance Bits: April 22


Plasmonics could improve solar performance, data storage According to researchers at Purdue University, plasmonic metamaterials that operate at high temperatures could significantly improve solar cell performance and make advanced computer data storage technology possible that uses heat to record information on a magnetic disk. These materials could make it possible to harness clouds of ele... » read more

Power/Performance Bits: August 20


Rechargeable flow battery for cheaper, large-scale energy storage In a creation that may eventually enable cheaper, large-scale energy storage, MIT researchers have engineered a new rechargeable flow battery that doesn’t rely on expensive membranes to generate and store electricity. According to the researchers, the palm-sized prototype generates three times as much power per square centi... » read more