tag: X-ray

Manufacturing Bits: Sept. 1
By Mark LaPedus - 01 Sep, 2015 - Comments: 0

Free-electron laser EUV consortium Extreme ultraviolet (EUV) lithography is delayed. Chipmakers hope to insert EUV at the 7nm node, but that’s not a given. As before, the big problem is the EUV light source. So far, the source can’t generate enough power to enable the required throughput for EUV in high-volume production. ASML’s current EUV source is operating at 80 Watts, up from 10 ... » read more

Manufacturing Bits: August 11
By Mark LaPedus - 11 Aug, 2015 - Comments: 0

World neutrino record The U.S. Department of Energy’s Fermi National Accelerator Laboratory has achieved a world record for high-energy neutrino experiments. In one neutrino experiment, researchers sustained a 521-kilowatt beam generated by the organization’s so-called Main Injector particle accelerator. The previous record was a 400-plus-kilowatt beam, which was accomplished at CERN. ... » read more

Manufacturing Bits: June 23
By Mark LaPedus - 23 Jun, 2015 - Comments: 0

Diamond shock waves For years, the industry has been exploring the use of diamonds for electronics applications. Diamonds could be used to reduce heat in electronic systems. In addition, diamond FETs are also intriguing. Diamond has a wide bandgap (5.45 eV), a high breakdown field (10MV/cm), and high thermal conductivity (22W/cmK). But it could take years before diamond FETs reach the mains... » read more

Manufacturing Bits: May 26
By Mark LaPedus - 26 May, 2015 - Comments: 0

Table-top EUV Swinburne University of Technology has developed a table-top extreme ultraviolet (EUV) laser power source. The source could be used to develop a system for use in metrology and other applications. The table-top setup is a new way to generate bright beams of coherent EUV radiation. It may offer a cost-effective alternative to large-scale facilities, such as synchrotrons or free... » read more

Manufacturing Bits: March 24
By Mark LaPedus - 24 Mar, 2015 - Comments: 0

Mouse brains to multi-beam At the recent SPIE Advanced Lithography conference, Sematech provided an update on its multi-beam, e-beam inspection program. The goal is to develop a next-generation inspection tool, which could be faster than traditional e-beam inspection and could one day displace brightfield inspection. “Optical inspection is having trouble detecting particles that are small... » read more

Manufacturing Bits: Dec. 2
By Mark LaPedus - 02 Dec, 2014 - Comments: 0

Storage ring EUV source Needless to say, extreme ultraviolet (EUV) lithography is delayed. Chipmakers hope to insert EUV at the 7nm node, but that’s not a given. As before, the big problem is the EUV light source. So far, the source can’t generate enough power to enable the required throughput for EUV in mass production. Researchers at the SLAC National Accelerator Laboratory have one p... » read more

Manufacturing Bits: Nov. 25
By Mark LaPedus - 25 Nov, 2014 - Comments: 0

Direct-write diamond patterning Purdue University has devised a new technique that uses a pulsing laser to create synthetic nanodiamond films and patterns on a graphite substrate. The ability to pattern diamond surfaces could one day be used to make chips, biosensors and fuel cells. In the lab, researchers devised a multi-layered film, which includes a layer of graphite topped with a glass ... » read more

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