A new design methodology is needed for rapid layout prototyping, in-design signoff and to improve collaboration between schematic and layout designers.
Custom and analog designers will lay the foundation for 20nm IC design. However, they face many challenges that arise from manufacturing complexity. The solution lies not just in improving individual tools, but in a new design methodology that allows rapid layout prototyping, in-design signoff, and close collaboration between schematic and layout designers.
To view this white paper, click here.
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