The Future Of Patterning
An interview Imec’s top patterning guru.
Greg McIntyre, director of advanced patterning at imec, offers his thoughts on what it’s like to work at one of the world’s leading nanoelectronics R&D centers, as well as the importance of eBeam technology to lithography and mask making, what’s driving up confidence in EUV, and the latest on imec’s joint venture with JSR in EUV resist development.
Jan Willis
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Jan Willis is an independent consultant at Calibra. She has held a variety of high-level positions at companies such as Cadence, Synopsys and Hewlett-Packard. She holds a B.S. in Electrical and Computer Engineering from the University of Missouri at Columbia, and an M.B.A. from Stanford University.
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