Jan Willis

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Jan Willis is co-founder of the eBeam Initiative. She has held a variety of high-level positions at companies such as Cadence, Synopsys and Hewlett-Packard. She holds a B.S. in Electrical and Computer Engineering from the University of Missouri at Columbia, and an M.B.A. from Stanford University.

Author's Latest Posts

How Will The Adoption Of Curvilinear Masks Affect Turnaround Time?
By Jan Willis - 01 Jun, 2021 - Comments: 0

Turnaround time (TAT) for photomask makers has historically increased at smaller and smaller process nodes, as reported in the eBeam Initiative Mask Makers surveys, so it’s important to look at the impact of curvilinear masks on TAT. In this sixth installment of our blog series on curvilinear masks, Aki Fujimura of D2S explores this question with luminaries in the industry during a video pane... » read more

Is The Photomask Ecosystem Ready For Curvilinear ILT?
By Jan Willis - 18 May, 2021 - Comments: 0

The time it takes to write a photomask with curvilinear shapes was a major historical barrier to adoption inverse lithography technology (ILT), as discussed in the second installment of our blog series on curvilinear mask shapes. After years of development, multi-beam mask writers came into production and one of their features is the ability to write curvilinear masks without a write time penal... » read more

How Extensively Will Curvilinear ILT Be Used For EUV Photomasks?
By Jan Willis - 29 Apr, 2021 - Comments: 0

Curvilinear shapes on photomasks lead to improved process windows, as the first installment of this blog series discussed. Our blog series continues with a video panel discussion of the benefits that curvilinear shapes have for EUV photomasks (masks) and whether curvilinear shapes will be used beyond today’s usage for hotspots. Our panellists approached the question of curvilinear ILT for ... » read more

How Do Multi-Beam Mask Writers Enable Curvilinear Shapes On Photomasks?
By Jan Willis - 15 Apr, 2021 - Comments: 0

Multi-beam mask writing was identified as one of the ways to eliminate hurdles to manufacturing curvilinear mask shapes in the last installment of this blog. Our blog series continues with an educational video explanation of why and how multi-beam writers reduce write time for curvilinear mask shapes that took place during an eBeam Initiative panel discussion with industry experts during the 20... » read more

Bending The Rules With Curvilinear Technology
By Jan Willis - 05 Apr, 2021 - Comments: 0

What have been the historical hurdles for curvilinear ILT? Danping Peng, director at TSMC, reflected on his early involvement in the development of ILT and the three major hurdles encountered while at Luminescent during a panel discussion with industry experts at the eBeam Initiative’s annual event during the 2021 SPIE Advanced Lithography Conference. Among the topics covered, the panel di... » read more

The Benefits Of Curvilinear Shapes On Photomasks
By Jan Willis - 15 Mar, 2021 - Comments: 0

Do you have four minutes to hear why companies like Micron Technology think that curvilinear shapes on photomasks are an advantage? In a short video, Ezequiel Russell, Senior Director of Mask Technology at Micron Technology shows how curvilinear shapes can increase process windows for advanced memory as shown in figure 1. The video was part of a longer panel discussion with industry experts at ... » read more

eBeam Initiative Surveys Report Upbeat Photomask Market Outlook
By Jan Willis - 05 Oct, 2020 - Comments: 0

Every year, the eBeam Initiative conducts surveys that provide valuable insight into the key trends that are shaping the semiconductor industry. This year, industry luminaries representing 42 companies from across the semiconductor ecosystem participated in the 2020 eBeam Initiative Luminaries survey. 89% of respondents to the survey predict that photomask (mask) revenues in 2020 will stay the ... » read more

Masks, Models And Alternative Lithography
By Jan Willis - 19 Apr, 2018 - Comments: 0

Every February an outstanding group of eBeam luminaries gathers at events hosted by the eBeam Initiative during the SPIE Advanced Lithography conference. It was our 10th annual lunch with standing room only attendance again this year. It’s an honor to get to know some of these very talented people. We started producing videos for the community over five years ago to share more of their storie... » read more

Getting Ready For EUV
By Jan Willis - 06 Sep, 2017 - Comments: 0

The highly anticipated introduction of extreme ultra-violet (EUV) lithography is reflected in recent surveys conducted by the eBeam Initiative, which will be presented on Sept. 11 at the annual Photomask Technology Symposium in Monterey, Calif.  There are many changes are coming to the mask industry, in addition to EUV. Those include greater use of inverse-lithography technologies (ILT) and... » read more

What’s Changing At BACUS
By Jan Willis - 17 Aug, 2017 - Comments: 0

Jim Wiley, president of SPIE BACUS, talks about this year's merger of the EUV Lithography Symposium and the SPIE Photomask Conference—including what's new and different, the latest updates on the event location, and topics to look forward to such as EUV mask inspection—as well as his predictions on machine learning. https://youtu.be/GNxUmMAU9zs » read more

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