Getting Ready For EUV

GPU acceleration opens the door to more accurate mask models.


The highly anticipated introduction of extreme ultra-violet (EUV) lithography is reflected in recent surveys conducted by the eBeam Initiative, which will be presented on Sept. 11 at the annual Photomask Technology Symposium in Monterey, Calif. 

There are many changes are coming to the mask industry, in addition to EUV. Those include greater use of inverse-lithography technologies (ILT) and the advent of multi-beam mask writing, which will require mask simulation. But any simulation is only as accurate as the model used. GPU acceleration opens the door for simulation-based correction of a multitude of complex mask effects based on physical models, affording practical simulation runtimes for these more complex models.
D2S’ TrueModel is a physical model that provides D2S’ mask-simulation products with the accuracy required for today’s leading-edge nodes. TrueModel includes complex modeling of dose, shape and exposure to provide the necessary accuracy for today’s advanced designs including even curvilinear designs. GPU acceleration enables TrueModel to provide physical-model accuracy within practical runtimes. TrueModel has been refined over six generations of test chips with unique structures to enable calibration and validation of advanced mask effects

A new TrueModel technical backgrounder is available for download. An example application of TrueModel is provided with the inline pixel-level dose correction (PLDC) capability in NuFlare Technology’s MBM-1000 multi-beam mask writer. Ryan Pearman from D2S will be presenting a TrueModel paper at the Photomask Technology Symposium, and has given talks throughout 2017 on TrueModel. You can watch videos of Ryan’s talks on the impact of Multi-beam Mask Writing on Mask Modeling and the impact of EUV on Mask Modeling. (link to

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