Toward Software-Defined Vehicles
By Ed Sperling - 24 Jul, 2024 - Comments: 0

Speed is everything when it comes to designing automotive electronics, but not in the usual way. In the past, product cycles often lasted five to seven years, from initial design to implementation inside of vehicles. That no longer works as vehicles adopt more electronic features to replace mechanical ones, and as competition heats up over the latest features and nearly instantaneous over-the-a... » read more

Unifying Storage Diversity: Leveraging PCIe IP for Multi-Device, Multi Form Factor Designs
By Synopsys - 24 Jul, 2024 - Comments: 0

In the fast-paced world of data storage, designers are racing to keep up with ever-evolving interface standards and form factors. This whitepaper explores the impact of these industry shifts, focusing on the integration of PCIe interfaces within the context of varying storage device form factors like the Enterprise and Datacenter Standard Form Factor (EDSFF). PCIe designs need to be flexible in... » read more

Essential Insights for Design PCIe 6.0 Interconnects
By Keysight - 24 Jul, 2024 - Comments: 0

PCI Express (PCIe) is a serial communication protocol that has progressed through generations to enhance data rates and functionality. The latest version, PCIe 6.0, doubles the data rate to 64 GT/s, enabling up to 256 GB/s of bandwidth in an x16 configuration. The technology incorporates PAM4 signaling and forward error correction to maintain high speeds with improved signal integrity and relia... » read more

Legacy Process Nodes Going Strong
By Bryon Moyer - 23 Jul, 2024 - Comments: 0

While all eyes tend to focus on the leading-edge silicon nodes, many mature nodes continue to enjoy robust manufacturing demand. Successive nodes stopped reducing die cost at around the 20nm node. “In the finFET era of processes, esoteric process requirements necessary to move technology forward with each generation have added significant cost and complexity,” explained Andrew Appleby, p... » read more

Precision Patterning Options Emerge For Advanced Packaging
By Gregory Haley - 23 Jul, 2024 - Comments: 0

The chip industry is ratcheting up investments in advanced packaging as it strives to keep pace with demands for increased functionality and higher performance, including novel patterning technologies that can reduce costs and speed time to market. Success in advanced packages is partly dependent on effectively managing the interconnectivity between the chips, which requires increasingly pre... » read more

Improving Line Edge Roughness Using Virtual Fabrication
By Qingpeng Wang - 23 Jul, 2024 - Comments: 0

Line edge roughness (LER) is a variation in the width of a lithographic pattern along one edge of a structure inside a chip. Line edge roughness can be a critical variation source and defect mechanism in advanced logic and memory devices and can lead to poor device performance or even device failure. [1~3]. Deposition-etch cycling is an effective technique to reduce line edge roughness. In this... » read more

Reliability Performance Of S-Connect Module (Bridge Technology) For Heterogeneous Integration Packaging
By Heejun Jang - 23 Jul, 2024 - Comments: 0

With the explosive increase in demand for artificial intelligence (AI), autonomous driving, Internet of Things (IoT), data centers, augmented reality and virtual reality (AR/VR), the market of high-performance computing (HPC) applications is growing rapidly [2]. And, the HPC market requires high processing speed, fast network clusters and large parallel computing. To meet the market requirement... » read more

Metrology Analysis Tool For Photolithography Process Characterization At Advanced Nodes
By Wolfgang Demmerle - 23 Jul, 2024 - Comments: 0

Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers are using single-digit nanometer figures or even Angstrom to label their manufacturing technology nodes, which are associated with the size of features patterned during the lithography process. ... » read more

European Mask And Lithography Conference 2024 Worth Attending
By Asmus Hetzel - 23 Jul, 2024 - Comments: 0

The European Mask and Lithography Conference (EMLC) 2024 recently was held in Grenoble, France, and had about 190 participants from a wide range of companies and institutions. Being relatively new to the field of lithography (my background is EDA, machine learning, optimization) and not being a fan of gigantic conferences, I thought it would be a good idea to visit this conference. My main p... » read more

CD Spec For Curvilinear Masks
By D2S - 23 Jul, 2024 - Comments: 0

Within the photomask industry, there's a major transformation from conventional Manhattan masks to more advanced curvilinear masks. Researchers from D2S and Micron Technology propose an equivalent CD spec for the curvy masks and use this spec to show that curvy masks have smaller mask variations than Manhattan masks. Find the technical paper here. Published June 2024. Linyong (Leo) Pang, ... » read more

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