Double patterning marks a turning point in terms of lithography, variability and complexity.
The 20nm process node represents a turning point for the electronics industry. While it brings tremendous power, performance and area advantages, it also comes with new challenges in such areas as lithography, variability, and complexity. The good news is that these become manageable challenges with 20nm-aware EDA tools when they are used within end-to-end, integrated design flows based on a “prevent, analyze, and optimize” methodology.
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